The global high k and ALD/CVD metal precursors market size was US$ 531 million in 2021. The global high k and ALD/CVD metal precursors market is forecast to grow to US$ 924.58 million by 2030 by registering a compound annual growth rate (CAGR) of 6.1% during the forecast period from 2022 to 2030.

Chemical vapor deposition (CVD) is used to place diverse thin films of carbides, amorphous metal, oxides, intermetallic compounds, an inorganic polymer, and nitrides. Chemical vapor deposition is the deposition of a solid on a heated surface through a chemical reaction in the vapor phase. Precursors for CVD of metal oxides are classified into inorganic, metal-organics, and organometallic compounds.

Factors Influencing the Market

The rising demand for nanotechnology applications will drive the global high k and ALD/CVD metal precursors market forward during the forecast period. Nanotechnology has the prospect for a wide range of applications in next-generation products, such as lighting, display technology, and biological imaging. Moreover, the growing electronics industry will surge the growth of the global high k and ALD/CVD metal precursors market.

Furthermore, growing investments in nanotechnology will contribute to the growth of the global high k and ALD/CVD metal precursors market. For instance, the United States invested nearly US$ 1.4 billion in the National Nanotechnology Initiative (NNI).

Growing advancements in the high k and ALD/CVD metal precursors market will benefit the market. For instance, Colnatec introduced an all-inclusive thin film controller Eon-ID in 2014.

The high risk of impurity levels may limit the growth of the global high k and ALD/CVD metal precursors market.

Regional Analysis

The Asia-Pacific high k and ALD/CVD metal precursors market is forecast to grow at the highest rate. It is due to the rapidly growing semiconductor industry in the region. Furthermore, the region is forecast to continue its dominance due to the rapidly growing electronics industry.

In addition, the presence of an advanced packaging base and large foundry of LED chip makers will benefit the overall high k and ALD/CVD metal precursors market.

COVID-19 Impact Analysis

The global high k and ALD/CVD metal precursors market witnessed a significant drop in terms of revenue due to the wake of the COVID-19 pandemic. The COVID-19 pandemic forced the industries to stop operation. The preference of governments also shifted to healthcare. As a result of this, the electronics industry observed several challenges.

The COVID-19 pandemic also halted the manufacturing activities. Innovations and partnership activities were also dropped for a significant time. Thus, all of these factors impeded the growth of the high k and ALD/CVD metal precursors market during the COVID-19 pandemic.

Competitors in the Market

Air Liquide
Dow Chemicals
Air Products and Chemicals Inc.
Merck Group
Nanmat Technology Co. Ltd.
Praxair Technology Inc.
Samsung Electronics Co. Ltd.
Tri Chemical Laboratories Inc.
TSI Incorporated
JSR Corp.
Other Prominent Players
Market Segmentation

The global high k and ALD/CVD metal precursors market segmentation focuses on Technology, Application, and Region.

By Technology

Interconnect
Capacitors
Gates
By Application

Semiconductor
Non-Semiconductor
By Region

North America
The U.S.
Canada
Mexico
Europe
Western Europe
The UK
Germany
France
Italy
Spain
Rest of Western Europe
Eastern Europe
Poland
Russia
Rest of Eastern Europe
Asia Pacific
China
India
Japan
Australia & New Zealand
ASEAN
Rest of Asia Pacific
Middle East & Africa (MEA)
UAE
Saudi Arabia
South Africa
Rest of MEA
South America
Brazil
Argentina
Rest of South America